Intel Foundry and ASML used the recent SPIE Photomask Technology and EUV Lithography conference in Monterey to announce the former has now processed more than one million 300mm wafers on ASML’s High-NA EUV scanners.
It’s a glorious day in Kirkland, Washington, an affluent Seattle suburb on the eastern shore of Lake Washington. The temperature is in the mid-80s, and the sky is incapable of being any more blue. The view from the Gates Ventures conference room overlooks the Carillon Point Marina, where a flotilla of expensive boats bob in…
